CVD EQUIPMENT AND CLEANING METHOD THEREOF

摘要

PURPOSE: A CVD(Chemical Vapor Deposition) equipment and a cleaning method thereof are provided to be capable of increasing the erosion resistance against CiF3 gas and effectively cleaning the CVD equipment by forming an oxide aluminium layer. CONSTITUTION: A boat of the CVD equipment is provided with a plurality of boat support bars and a pair of plates located and fixed at both ends of the boat support bars. The boat support bar is provided with a plurality of grooves(123) spaced apart from each other for resting semiconductor substrates on the boat support bar. A framework(121) of the boat is composed of SiC. An oxide aluminium layer(122) is formed on the framework(121) for preventing contaminants in the framework(121) from being exhausted to the outside. The oxide aluminium layer(122) is uninfluenced by ClF3 or NF3 gas, so that the ClF3 gas is capable of being used during the dry cleaning process.