发明名称 Antiscattering grid and a method of manufacturing such a grid
摘要 An antiscattering grid for an X-ray imaging apparatus of the type comprising a substrate having a plurality of metallized partitions that together define a plurality of cells distributed over the substrate. The partitions allow passage of the X-rays emitted from a source lying in line with the grid, and absorbing the X-rays not coming directly from this source. The substrate is made of a polymer material that may be formed by radiation curing of a monomer sensitive to this radiation. The substrate may be substantially planar and the partitions may be oriented to form a focused grid.
申请公布号 US2003081731(A1) 申请公布日期 2003.05.01
申请号 US20020269580 申请日期 2002.10.11
申请人 SOUCHAY HENRI;KLAUSZ REMY;BACHER GUILLAUME;RICHOU BRUNO GILLES 发明人 SOUCHAY HENRI;KLAUSZ REMY;BACHER GUILLAUME;RICHOU BRUNO GILLES
分类号 G21K1/02;(IPC1-7):G21K1/00 主分类号 G21K1/02
代理机构 代理人
主权项
地址