发明名称 |
Antiscattering grid and a method of manufacturing such a grid |
摘要 |
An antiscattering grid for an X-ray imaging apparatus of the type comprising a substrate having a plurality of metallized partitions that together define a plurality of cells distributed over the substrate. The partitions allow passage of the X-rays emitted from a source lying in line with the grid, and absorbing the X-rays not coming directly from this source. The substrate is made of a polymer material that may be formed by radiation curing of a monomer sensitive to this radiation. The substrate may be substantially planar and the partitions may be oriented to form a focused grid.
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申请公布号 |
US2003081731(A1) |
申请公布日期 |
2003.05.01 |
申请号 |
US20020269580 |
申请日期 |
2002.10.11 |
申请人 |
SOUCHAY HENRI;KLAUSZ REMY;BACHER GUILLAUME;RICHOU BRUNO GILLES |
发明人 |
SOUCHAY HENRI;KLAUSZ REMY;BACHER GUILLAUME;RICHOU BRUNO GILLES |
分类号 |
G21K1/02;(IPC1-7):G21K1/00 |
主分类号 |
G21K1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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