发明名称 Wärmehärtbare Zusammensetzung und Flachdruckplatte, die diese verwendet
摘要 <p>The heat-hardenable composition of the present invention comprises a compound having two or more sulfonic acid ester groups each capable of releasing sulfonic acid by the action of heat. Further, the composition may comprise a compound having two or more groups each reactive with the group generated by the thermal release of sulfonic acid. Still further, the composition may comprise a compound which has two or more sulfonic acid ester groups each capable of releasing sulfonic acid by the action of heat and which has two or more groups each reactive with the group generated by the thermal release of sulfonic acid. The compound having two or more sulfonic acid ester groups each capable of releasing sulfonic acid by the action of heat may contain the structure represented by the following general formula (1): <CHEM> where L represents an organic group comprising polyvalent non-metallic atoms which is necessary for linking the structure represented by the general formula (1) to a polymer skeleton; and R<1> and R<2> each represent a substituted or unsubstituted alkyl group or otherwise a substituted or unsubstituted aryl group.</p>
申请公布号 DE69906171(D1) 申请公布日期 2003.04.30
申请号 DE1999606171 申请日期 1999.04.09
申请人 FUJI PHOTO FILM CO., LTD. 发明人 KAWAMURA, KOICHI
分类号 G03F7/004;B41C1/055;B41C1/10;B41M5/36;B41N1/14;C07C309/29;C07C309/30;C07C309/39;C07C309/42;C07C309/51;C08F12/30;C08F20/38;C08F246/00;C08L101/02;C09D11/00;C09D201/02;G03F7/038;(IPC1-7):B41C1/10 主分类号 G03F7/004
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