发明名称 |
Optisches Element und Verfahren zu dessen Herstellung sowie ein Lithographiegerät und ein Verfahren zur Herstellung eines Halbleiterbauelements |
摘要 |
In order to reduce contamination of optical elements which comprise a multilayer system on a substrate, it is proposed that the layer material and/or the layer thickness of at least one layer of the multilayer system are/is selected such that the standing wave which forms during reflection of the irradiated operating wavelength, forms a node of the electrical field intensity (node condition) in the area of the free interface of the multilayer system. Furthermore, a method for determining a design of a multilayer system, as well as a manufacturing process and a lithography apparatus are described. |
申请公布号 |
DE10150874(A1) |
申请公布日期 |
2003.04.30 |
申请号 |
DE2001150874 |
申请日期 |
2001.10.04 |
申请人 |
CARL ZEISS |
发明人 |
YAKSHIN, ANDREY E.;LOUIS, ERIC;BIJKERK, FREDERIK;WEDOWSKI, MARCO;KLEIN, ROMAN;STIETZ, FRANK |
分类号 |
G02B5/08;G03F1/16;G03F7/20;G21K1/06;G21K5/02;H01L21/027;(IPC1-7):G02B1/10 |
主分类号 |
G02B5/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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