| 发明名称 |
Inspection system for the pupil of a lithographic tool |
| 摘要 |
An inspection tool or inspection system can be utilized to determine whether the appropriate pattern is on a reticle. The reticle can be associated with EUV lithographic tools. The system utilizes an at least two wavelengths of light. The light is directed to the reticle at the at least two wavelengths of light.
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| 申请公布号 |
US6556286(B1) |
申请公布日期 |
2003.04.29 |
| 申请号 |
US20010845789 |
申请日期 |
2001.04.30 |
| 申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
LA FONTAINE BRUNO M.;LEVINSON HARRY J.;KYE JONGWOOK |
| 分类号 |
G03F7/20;(IPC1-7):G01B9/00 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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