发明名称 |
Method of determining lethality of defects in circuit pattern inspection, method of selecting defects to be reviewed, and inspection system of circuit patterns involved with the methods |
摘要 |
A method of reviewing defects on a substrate. The method includes inputting information of defects on a substrate detected by a detection apparatus, identifying cluster of defects detected on the substrate by using the inputted information, selecting defects to be reviewed from the cluster identified, reviewing the selected defects, and classifying the reviewed defects.
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申请公布号 |
US6556955(B2) |
申请公布日期 |
2003.04.29 |
申请号 |
US20010012380 |
申请日期 |
2001.12.12 |
申请人 |
HITACHI, LTD. |
发明人 |
YOSHITAKE YASUHIRO;SHIBA MASATAKA;SHIMODA ATSUSHI |
分类号 |
G01B11/24;G01N21/88;G01N21/94;G01N21/956;H01L21/02;H01L21/66;(IPC1-7):G06F11/16 |
主分类号 |
G01B11/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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