发明名称 |
EXCIMER LASER OSCILLATION APPARATUS AND METHOD, EXCIMER LASER EXPOSURE APPARATUS, AND LASER TUBE |
摘要 |
This invention relates to an excimer laser oscillation apparatus which has a laser chamber which stores a laser gas containing a gas mixture of at least one inert gas selected from the group consisting of Kr, Ar, and Ne, and F2 gas, and in which an inner surface thereof has a reflection-free surface with respect to light of a desired wavelength of 248 nm, 193 nm, or 157 nm, and the uppermost surface of the inner surface consists of a fluoride, an optical resonator which is made up of a pair of reflection mirrors arranged to sandwich the laser chamber therebetween, and in which the reflectance of the reflection mirror on the output side is 90% or more and microwave introduction means, arranged on the laser chamber, for continuously exciting the laser gas in the laser chamber.
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申请公布号 |
CA2210830(C) |
申请公布日期 |
2003.04.29 |
申请号 |
CA19972210830 |
申请日期 |
1997.07.18 |
申请人 |
CANON KABUSHIKI KAISHA;OHMI, TADAHIRO |
发明人 |
OHMI, TADAHIRO;HIRAYAMA, MASAKI;TANAKA, NOBUYOSHI |
分类号 |
H01S3/041;H01S3/08;H01S3/0975;H01S3/225;(IPC1-7):H01S3/10 |
主分类号 |
H01S3/041 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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