| 发明名称 |
Barrier for and a method of reducing outgassing from a photoresist material |
| 摘要 |
A barrier layer can be provided over a photoresist film to prevent outgassing. The barrier layer can be relatively highly transmissive to radiation at the actinic wavelength. The barrier layer can be removed before the photoresist layer is developed.
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| 申请公布号 |
US6555234(B1) |
申请公布日期 |
2003.04.29 |
| 申请号 |
US20010775016 |
申请日期 |
2001.02.01 |
| 申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
PIAO FAN |
| 分类号 |
G03F7/11;G03F7/20;(IPC1-7):B32B9/00;B32B9/04 |
主分类号 |
G03F7/11 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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