| 摘要 |
Compositions for the removal of polymeric material from a substrate are provided where the compositions include a polyol compound selected from (C3-C20)alkanediols, substituted (C3-C20)alkanediols, (C3-C20)alkanetriols or substituted (C3-C20)alkanetriols, a glyco ether, at least 5% wt water based on the total weight of the composition, and a fluoride salt selected from ammonium fluoride, ammonium bifluoride, ammonium-tetramethylammonium bifluoride or mixtures thereof. Methods of removing polymeric material using these compositions are also provided.
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