发明名称 Integrated circuit package via
摘要 A method of forming a via in a circuit, such that parasitic capacitance is reduced. The surface layers of the circuit are identified, to which continuity with the via is desired, and secondary layers of the circuit are also identified. Via lands are formed only on the surface layers and not on the secondary layers. The via lands are formed in first portions of the surface layers, where the via is to pass through the surface layers. Nonconductive cut outs are formed in second portions of the secondary layers where the via is to pass through the secondary layers. The surface layers and the secondary layers of the circuit are laminated together. The first portions of the surface layers are aligned with the second portions of the secondary layers. A through hole is formed through the via lands formed in the surface layers, and also through the cut outs formed in the secondary layers. The via is formed in the through hole. The parasitic capacitance of the via is reduced by not having via lands on the secondary layers.
申请公布号 US6555914(B1) 申请公布日期 2003.04.29
申请号 US20010975871 申请日期 2001.10.12
申请人 LSI LOGIC CORPORATION 发明人 THURAIRAJARATNAM ARITHARAN;PATEL PRADIP D.;THAVARAJAH MANICKAM;LIM HONG T.
分类号 H01L21/48;H01L23/498;H05K1/11;H05K3/42;(IPC1-7):H01L23/52;H01L21/44;H01L21/76;B05D5/12 主分类号 H01L21/48
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