发明名称 Method for manufacturing photothermographic materials
摘要 In the case where multiple slide hopper is used for simultaneous multilayer bead coating of photosensitive material, streak defect is occasionally cause, particularly in the case of coating photothermographic material, especially when the outermost layer includes materials capable of increasing optical density such as toner it more frequently happens. It is found that streak defect is restrained when meniscus curvature of upper side bead becomes less than 7.2 mm-1. This condition can be kept by selecting a proper value of clearance between the web surface and the lip of the slide hopper, that is from 0.10 mm to 0.40 mm, and a proper value of pressure in a lower side of the bead, that is from -100 Pa to -700 Pa.
申请公布号 US6555309(B2) 申请公布日期 2003.04.29
申请号 US20010011772 申请日期 2001.12.11
申请人 FUJI PHOTO FILM CO., LTD. 发明人 KATO AKIFUMI
分类号 B05C5/00;B05C9/06;B05D1/26;B05D7/00;G03C1/498;G03C1/74;G03C1/76;(IPC1-7):G03C1/00;B05D1/30 主分类号 B05C5/00
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