发明名称 Method for laser scribing of wafers
摘要 A method for laser scribing a semiconductor substrate with coatings on top. The method comprises the steps of focusing a laser beam on a top surface of the substrate coating; absorbing energy from the laser into the coating layer; forming a first set of scribe lines in a first direction on the substrate by scanning the laser beam across the surface of the substrate to evaporate portions of the coating layer; and forming a second set of scribe lines in a second direction on the surface of the substrate substantially orthogonal to the first set of scribe lines to evaporate portions of the layer.
申请公布号 US6555447(B2) 申请公布日期 2003.04.29
申请号 US20010817959 申请日期 2001.03.27
申请人 KULICKE & SOFFA INVESTMENTS, INC. 发明人 WEISHAUSS ILAN;MANOR RAN;WERTHEIM ODED
分类号 B23K26/40;B28D1/22;B28D5/00;B28D5/02;H01L21/78;H01S5/02;(IPC1-7):H01L21/78 主分类号 B23K26/40
代理机构 代理人
主权项
地址