发明名称 |
Method for laser scribing of wafers |
摘要 |
A method for laser scribing a semiconductor substrate with coatings on top. The method comprises the steps of focusing a laser beam on a top surface of the substrate coating; absorbing energy from the laser into the coating layer; forming a first set of scribe lines in a first direction on the substrate by scanning the laser beam across the surface of the substrate to evaporate portions of the coating layer; and forming a second set of scribe lines in a second direction on the surface of the substrate substantially orthogonal to the first set of scribe lines to evaporate portions of the layer.
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申请公布号 |
US6555447(B2) |
申请公布日期 |
2003.04.29 |
申请号 |
US20010817959 |
申请日期 |
2001.03.27 |
申请人 |
KULICKE & SOFFA INVESTMENTS, INC. |
发明人 |
WEISHAUSS ILAN;MANOR RAN;WERTHEIM ODED |
分类号 |
B23K26/40;B28D1/22;B28D5/00;B28D5/02;H01L21/78;H01S5/02;(IPC1-7):H01L21/78 |
主分类号 |
B23K26/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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