| 摘要 |
PURPOSE: Provided is a positive type photosensitive resist composition, which uses an economical photoacid generator and has high resolution by exposing with near UV and developing with weak alkaline developer. CONSTITUTION: The positive type photosensitive resist composition comprises a compound having one or more dichloroacetyl groups as a photoacid generator. In particular, the compound is represented by the formula 1, wherein each of R1, R2, R3 and R5 is a substituent selected from hydrogen, a halogen, cyano, a C1-C3 linear or branched non-substituted alkyl, a C1-C3 linear or branched alkyl substituted with hydroxy and phenyl; R4 is a substituent selected from hydrogen, a halogen, cyano, a C1-C3 linear or branched non-substituted alkyl, a C1-C3 linear or branched alkyl substituted with hydroxy, phenyl and dichloroacetyl; and X is a divalent linkage selected from O, S, CH2, C(CH3)2 and C=O.
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