| 摘要 |
PURPOSE: A surface acoustic wave device and a manufacturing method thereof are provided to be capable of preventing the deterioration of characteristics due to the absorption of moisture and reducing fabrication cost. CONSTITUTION: A surface acoustic wave device is provided with a piezoelectric substrate(1a), an interdigital electrode part(1b) formed at the upper portion of the piezoelectric substrate, and a function film(4) partially formed at the upper portion of the interdigital electrode part. At this time, the function film is made of one selected from a group consisting of a nitride silicon layer, an oxide silicon layer, and an oxide nitride silicon layer for improving weather resistance. The surface acoustic wave device further includes a package(2) capable of exhausting moisture, installed at the resultant structure for storing the resultant structure. At the time, the function film is formed by carrying out an electron cyclotron resonance sputtering process. |
