发明名称 PATTERN PROCESSED OBJECT AND MANUFACTURING METHOD OF THE SAME
摘要 PURPOSE: To provide a manufacturing method of forming processed patterns of which, the depth is different from each other, and to provide a processed pattern having a U-shaped cross section of which, the depth and the width smoothly changes. CONSTITUTION: Mask patterns with semicircle-shaped cross section 62 and mask patterns with V-shaped cross section 65 are formed with different opening widths 63, 64 from each other, and sand blast process is applied to the mask patterns 62, 65. Deep grooves are formed between the mask patterns with semicircle-shaped cross section 62, and shallow grooves are formed between the mask patterns with V-shaped cross section 65.
申请公布号 KR20030032824(A) 申请公布日期 2003.04.26
申请号 KR20020040145 申请日期 2002.07.11
申请人 NEC CORPORATION 发明人 KAWANISHI YOSHITAKA
分类号 B24C1/04;B24C1/00;B24C3/32;G03F1/14;G03F7/00;H01J9/02;H01J9/24;H01J11/22;H01J11/34;H01J11/36;H01L21/311 主分类号 B24C1/04
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