发明名称 PLASMA COATING METHOD
摘要 The invention concerns in particular a method for using low pressure plasma to deposit a coating on an object to be treated, whereby the plasma is obtained by partially ionising, under the action of an electromagnetic field, a reaction fluid injected under low pressure into a treatment zone. The invention is characterised in that the method comprises at least two steps: a first step during which the reaction fluid is injected into the treatment zone at a first flow rate and under a given pressure, and a second step during which the same reaction fluid is injected into the treatment zone at a second flow rate lower than the first.
申请公布号 KR20030033003(A) 申请公布日期 2003.04.26
申请号 KR20037001179 申请日期 2003.01.27
申请人 发明人
分类号 B65D23/02;C23C14/22;B65D25/14;C23C16/04;C23C16/26;C23C16/44;C23C16/455;C23C16/50 主分类号 B65D23/02
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