| 摘要 |
PURPOSE: A method for manufacturing a liquid crystal display device is provided to improve an aperture ratio by forming common lines without any mask, thereby improving the picture quality. CONSTITUTION: A conductor is deposited on a substrate(100), and then is selectively removed to form gates(120). An ITO and an insulating film are formed on the substrate in order. An amorphous silicon is deposited on the insulating film, and is selectively removed to form an active layer(160). An etching blocking layer(180) is formed on the active layer to prevent etching of the active layer. The insulating film and the transparent layer are selectively removed to form contact holes and common lines(130b). Source and drain electrodes(200a,200b), and pixel electrodes(220), and a passivation film(240) are formed on the substrate in order.
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