| 摘要 |
PROBLEM TO BE SOLVED: To provide a microwave plasma processor which can generate uniform plasma into a container even if pressure in the container is dropped, and the type of processing gas, pressure in the container and supply power are changed. SOLUTION: The processor is provided with the container where a member to be processed is arranged, a gas supply pipe for supplying processing gas into the container, dielectric windows fitted to one face of the container, a waveguide arranged outside one face of the container including the dielectric windows, and a microwave power source for introducing a microwave into the waveguide. The dielectric windows are fitted to a plurality of openings disposed on one face of the container. Microwave radiating parts are opened to the parts of the waveguides positioned near one face of the container in accordance with a plurality of dielectric windows. |
