| 摘要 |
PROBLEM TO BE SOLVED: To provide a negative resist composition having statisfying, at the same time, characteristics of sensitivity, resolution, pattern profile and line edge roughness for the use of KrF excimer laser, electron beams and X rays. SOLUTION: The negative resist composition is characterized in containing (A) a compound which generates an acid by irradiation of active rays or radiation, (B) an alkali-soluble polymer and (C) a crosslinking agent which crosslinks with the polymer (B) by the effect of an acid, and also it is characterized in that the crosslinking agent (C) contains at least two kinds of compounds having different skeletons selected from phenol derivatives having two or more hydroxymethyl groups and/or alkoxymethyl groups in benzene rings, and one kind of the crosslinking agent has one or more benzene rings in the molecule and another crosslinking agent has three to five benzene rings in the molecule. |
