LASER CRYSTALLIZATION METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE, AND METHOD OF MANUFACTURING ELECTROLUMINESCENCE DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To carry out laser crystallization, conforming to the forming position of a TFT so as to improve the channel region of the TFT in crystallinity and the TFT in performance. SOLUTION: A manufacturing method comprises a first process of forming a metal film pattern 12 on a substrate 11 and sequentially forming an insulating film 13 and a semiconductor film (non-single crystal film) 14 on the substrate 11 so as to cover the metal film pattern 12, a second process of irradiating a prescribed spot on the semiconductor film 14 with a laser beam 21 having an irradiation region formed into a prescribed shape to crystallize the irradiated region as the metal film pattern 12 is used as an alignment mark, and a third process of irradiating a spot slightly off the above spot with a laser beam 22 having an irradiation region formed into a prescribed shape so as to make its irradiated region overlap partially with the former region irradiated with the laser beam 21 and to crystallize the irradiated region.