发明名称 ELECTRON BEAM EQUIPMENT AND DEVICE-MANUFACTURING METHOD USING SAME ELECTRON BEAM EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide an electron beam equipment which prevents dielectric breakdown between electrodes of an electron optics system, especially that in multiple beams, and a device manufacturing method using the electron beam equipment. SOLUTION: At least one of the lens electrodes inside a primary or a secondary optical system is coated with metal with work function of not less than 4.5 eV. Metal with which the lens electrodes inside the first or the second optical system are coated are to be platinum, iridium, ruthenium, rhenium, osmium, or an alloy with platinum as a main material.
申请公布号 JP2003123679(A) 申请公布日期 2003.04.25
申请号 JP20010316608 申请日期 2001.10.15
申请人 EBARA CORP 发明人 HAMASHIMA MUNEKI;NAKASUJI MAMORU;NOMICHI SHINJI;SATAKE TORU;SOFUGAWA TAKUJI
分类号 H01L21/66;H01J37/12;(IPC1-7):H01J37/12 主分类号 H01L21/66
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