| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a patterning method for preventing the thermal damage of a substrate due to the work defect of a film laminated on the substrate and energy beam. SOLUTION: A transparent electrode film 40 laminated on a photoelectric conversion layer 3 is irradiated with a laser beam 63. A recess 41 shallower than the thickness of the translucent electrode film 40 is formed in the translucent electrode film 40 (a). The translucent electrode film 40 is etched (b). The translucent electrode film 40 remaining in the irradiation position of the laser beam 63 is removed, and the translucent electrode film 4 in required thickness with a divided groove 42 is formed (c).</p> |
