METHOD OF CONTROLLING PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method of controlling a processing device. SOLUTION: A value difference between the input value of an aligner used for subjecting a photoresist layer on a wafer W to light exposure and a measured value obtained through an overlay measuring unit 20 which measures the exposed and developed photoresist pattern is obtained, a correction value for correcting the input value so as to reduce the value difference is calculated, and the correction value is managed as exposure process data by the generation hour. The past process data having the same history with a new lot are retrieved, and the bias component of a current correction value is estimated on the basis of the latest past correction values out of the retrieved process data. The random component of a current correction value is estimated through a neural network on the basis of the latest past random correction values out of the past process data, and the bias component and the random component which are estimated are added up to the current correction value of the aligner, and the neural network is made to learn that a change in a random component is estimated by the use of a value difference.