| 摘要 |
PROBLEM TO BE SOLVED: To provide a technique for preventing a proton working as acid from being scattered from a resist surface when heat-treating a substrate where chemical amplification type resist is applied for exposure. SOLUTION: A mesh-like electrode or the like is provided so that the mesh- like electrode opposes the surface of a substrate that is placed on the placement table of a substrate heating apparatus, and the electrode is connected to a positive electrode side at a DC power supply section. Although a proton working as acid generated on the surface of resist in exposure diffuses into an exposure region due to heating, coulomb force toward a substrate side operates since positive charge is charged to an upper-side electrode, thus preventing diffusion due to purge gas flow in the acid on the surface of the resist, and hence obtaining an superb resist pattern. Additionally, an electrode connected to a negative-electrode side may be provided at the back side of the substrate, for example, the lower side of a placement table. |
