ELECTRON BEAM DEVICE AND ELECTRON BEAM ADJUSTING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an electron beam device and an electron beam adjusting method capable of focusing electron beams and adjusting aberration at high speed and in high precision. SOLUTION: A standard sample for adjusting the shape of irradiation spots for electron beams includes at least a standard pattern each composed of a plurality of lattice structures aligned in the radius direction with a single point as a center on one and the same plane.