| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a mask that can transfer an angled pattern without forming an angle at the opening section of the mask, and a manufacturing method of the mask, and to provide a projection aligner and a manufacturing method of a semiconductor device. SOLUTION: In a mask 10, the manufacturing method of the mask 10, a projection aligner, and the manufacturing method of a semiconductor device; the mask 10 has a first mask 21 for shielding a charged particle beam (preferably, an electron beam), a first opening 23 that does not have an angle for transmitting the charged particle beam formed in the first mask 21, a second mask 22 that is used while being overlapped to the first mask 21 and shields the charged particle beam, and a second opening 24 that is formed in the second mask so that it has a portion that is overlapped to the first opening and does not have any corners for transmitting the charged particle beam.</p> |
