PATTERNING METHOD, SEMICONDUCTOR DEVICE, ELECTRIC CIRCUIT, DISPLAY MODULE, COLOR FILTER AND LIGHT EMITTING ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a patterning method capable of reducing a production cost by simplifying production processes. SOLUTION: The patterning method comprises a step for depositing a resist film on the surface of a member being treated (S270), a step for forming a recess of wiring pattern by the resist film (S272), a step for subjecting the surface of the resist film to liquid repellent treatment for a solution of patterning material (S274), a step for subjecting the recess of the wiring pattern to lyophilic treatment (S276), a step for filling the recess of the wiring pattern with the solution of patterning material (S280), and a step for removing the resist film to leave the wiring pattern of the patterning material (S296).