PROJECTION ALIGNER, EXPOSURE METHOD, AND EDIT SYSTEM OF EXPOSURE INFORMATION

摘要

PROBLEM TO BE SOLVED: To enable speedy treatment of a simple job or editing of a reticle file. SOLUTION: Various kinds of exposure information for exposing the pattern of an original onto a substrate to form a layer are stored into a database. When the information that is stored in the database is to be edited and preserved or updated, the exposure information used in the formation of a foundation layer that is formed before a layer is exposed is referred to and at the same time edited.