| 摘要 |
<p>A lithographic projection apparatus comprises a contaminant trap (10) for trapping debris from the radiation source (LA) or from the resist (RL) on a substrate (W), which trap comprises two sets (11,12) of channels (20,21:30,31) arranged radially around the optical axis of the projection beam (PB) with a space (13) between them. Gas is supplied to the space. The flow resistance of the channels ensures that the gas pressure outside the trap (10) is much lower then that inside.</p> |
