发明名称 SYSTEM AND METHOD FOR ELECTROLYTIC PLATING
摘要 <p>The present invention includes an electrolytic plating system with an elecrolytic plating bath, means for positioning the printed circuit boards in the bath, and means to alternately generate a laminar flow of electrolyte on each side of the printed circuit boards. A preferred means to alternately generate a laminar flow of electolyte comprises a floating shield (20) with a venturi-shaped partition (25) and an aligned partition (24) below the printed circuit boards, and operating a plurality of eductors (22) below the floating shield. The means to alternately generate a laminar flow of electrolyte can further comprise a transport mechanism that moves the floating shield and its partitions from side to side relative to the eductors or a mechanism to move the eductors. The plating can be also be improved by using a vibrator and a spring-mounting system that prevents vibration energy being absorbed by fixed portions of the plating system.</p>
申请公布号 WO2003033770(A2) 申请公布日期 2003.04.24
申请号 US2002033530 申请日期 2002.10.21
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