发明名称 SCHICHTMATERIAL SOWIE VORRICHTUNG UND VERFAHREN ZUM HERSTELLEN VON SCHICHTMATERIAL
摘要 In a method for producing laminate, a buffer layer is applied to a substrate, with the buffer layer material being evaporated from the buffer layer material dispensing devices at an angle alpha1<> 0 at the normal to the substrate surface onto the latter, before an oriented thin layer is evaporated. According to the invention, provision is made such that (a) following evaporation of the buffer layer and prior to the evaporation of the oriented thin layer, at least one cover layer is evaporated under deposition conditions that vary from those under which the buffer layer was applied, especially at a different pressure, different temperature, different rate, and/or different angle alpha2<> alpha1, especially alpha2<alpha1, preferably alpha2≈0° to the substrate surface normal, and/or is evaporated on the buffer layer in such fashion that the buffer layer has a biaxial texture and/or facets.
申请公布号 DE59709577(D1) 申请公布日期 2003.04.24
申请号 DE1997509577 申请日期 1997.12.08
申请人 THEVA DUENNSCHICHTTECHNIK GMBH 发明人 KINDER, HELMUT;BAUER, MARKUS;SCHWACHULLA, JOACHIM
分类号 H01F41/20;C23C14/02;C23C14/08;C23C14/22;C23C14/30;C30B29/22;H01B12/06;H01B13/00;H01F10/08;H01F10/32;H01L39/02;H01L39/24;H01L43/08;(IPC1-7):C23C14/22 主分类号 H01F41/20
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