发明名称 |
METHOD FOR REMOVING HALOGEN-CONTAINING GAS |
摘要 |
<p>A method for removing a halogen−containing gas,which comprises contacting a halogen−containing gas generating at least one selected from the group consisting of HF,HCl,HBr and HI when contacted with water with granules comprising a solid base and a carbonaceous material in amounts of 60 to 99.9 mass % and 0.1 to 40 mass %,respectively,based on the total mass of the granules in the presence of water.The solid base is preferably sodium hydrogen carbonate,and the carbonaceous material is preferably an activated carbon having an average pore radius of 0.1 to 50 nm and a pore volume of 0.05 to 4 cm<sp>3</sp>/g.The method is advantageous in that the generation of heat by an adsorbent is suppressed,it exhibits an improved capability of treating a halogen−containing gas,the generation of odor by spent adsorbents and solid wastes is reduced,and the completion of a reaction can be easily judged.</p> |
申请公布号 |
WO03033115(A1) |
申请公布日期 |
2003.04.24 |
申请号 |
WO2002JP10614 |
申请日期 |
2002.10.11 |
申请人 |
ASAHI GLASS COMPANY, LIMITED;HIRANO, HACHIRO;ARIMA, HISAKAZU;MORI, YOICHI |
发明人 |
HIRANO, HACHIRO;ARIMA, HISAKAZU;MORI, YOICHI |
分类号 |
B01D53/04;B01D53/68;B01D53/80;B01J20/04;B01J20/10;B01J20/12;B01J20/18;B01J20/20;(IPC1-7):B01D53/68 |
主分类号 |
B01D53/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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