发明名称 METHOD AND DEVICE FOR FABRICATING SEMICONDUCTOR LIGHT EMITTING ELEMENTS
摘要 When a semiconductor light emitting device or a semiconductor device is manufactured by growing nitride III-V compound semiconductor layers, which will form a light emitting device structure or a device structure, on a nitride III-V compound semiconductor substrate composed of a first region in form of a crystal having a first average dislocation density and a plurality of second regions having a second average dislocation density higher than the first average dislocation density and periodically aligned in the first region, device regions are defined on the nitride III-V compound semiconductor substrate such that the device regions do not substantially include second regions, emission regions or active regions of devices finally obtained do not include second regions.
申请公布号 CA2655579(A1) 申请公布日期 2003.04.24
申请号 CA20022655579 申请日期 2002.10.03
申请人 SONY CORPORATION;SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 GOTO, OSAMU;ASATSUMA, TSUNENORI;MOTOKI, KENSAKU;TOMIYA, SHIGETAKA;TOJO, TSUYOSHI;TAMAMURA, KOSHI
分类号 H01L21/20;C30B25/02;C30B29/38;C30B29/40;H01L21/78;H01L29/20;H01L33/00;H01L33/02;H01L33/16;H01L33/32;H01S5/02;H01S5/20;H01S5/22;H01S5/223;H01S5/323;H01S5/343;H01S5/40 主分类号 H01L21/20
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