Manufacturing integrated semiconducting circuit involves implementing short, wide range wiring in same metallization plane, showing each different form on different layer type drawing

摘要

The method involves implementing at least two different wiring forms in the same metallization plane, i.e. short range and wide range wiring, with wide range wiring (1) essentially for signal and supply lines, e.g. over several functional blocks, and short range wiring (2) essentially for individual components within a functional block. Each different wiring form is shown on a different layer type drawing.