发明名称 Field emission-type electron source
摘要 A lower electrode (2) and surface electrode (7) composed of a layer-structured conductive carbide layer is formed on one principal surface side of the substrate (1) composed of an insulative substrate such as a glass or ceramic substrate. A non-doped polycrystalline silicon layer (3) is formed on the lower electrode (2), An electron transit layer (6) composed of an oxidized porous polycrystalline silicon is formed on the polycrystalline silicon layer (3). The electron transit layer (6) is composed of a composite nanocrystal layer including polycrystalline silicon and many nanocrystalline silicons residing adjacent to a grain boundary of the polycrystalline silicon. When voltage is applied between the lower electrode (2) and the surface electrode (7) such that the surface electrode (7) has a higher potential, electrons are injected from the lower electrode (2) toward the surface electrode (7), and emitted through the surface electrode (7) through the electron transit layer (6).
申请公布号 US2003076023(A1) 申请公布日期 2003.04.24
申请号 US20020252800 申请日期 2002.09.24
申请人 MATSUSHITA ELECTRIC WORKS, LTD. 发明人 KOMODA TAKUYA;TAKEGAWA YOSHIYUKI;AIZAWA KOICHI;HATAI TAKASHI;ICHIHARA TSUTOMU;HONDA YOSHIAKI;WATABE YOSHIFUMI;BABA TORU
分类号 H01J1/30;H01J1/00;H01J1/304;H01J1/312;H01J9/02;H01J37/06;(IPC1-7):H01J1/00 主分类号 H01J1/30
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