发明名称 |
CORROSION-RESISTANT ELECTRODE STRUCTURE FOR INTEGRATED CIRCUIT DECOUPLING CAPACITORS |
摘要 |
A corrosion resistant electrode structure for interconnecting a decoupling capacitor to a substrate is disclosed. In an exemplary embodiment of the invention, the electrode structure includes a first chromium layer formed upon the capacitor and a first nickel layer formed upon the first chromium layer. A noble metal conductive layer is then formed upon the first nickel layer and a second nickel layer is formed upon said noble metal conductive layer. The second nickel layer has a thickness which is greater than a thickness of the first nickel layer. A second chromium layer is then formed upon the nickel layer.
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申请公布号 |
US2003075805(A1) |
申请公布日期 |
2003.04.24 |
申请号 |
US20010047475 |
申请日期 |
2001.10.23 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
COPELAND BRUCE A.;GORRELL REBECCA YUNG;SCHEIDER DONALD W.;TAKACS MARK A.;TRAVIS KENNETH J.;ULANMO PETER O.;WANG JUN |
分类号 |
H01L21/02;H01L23/64;(IPC1-7):H01L31/062;H01L23/52;H01L23/48;H01L29/40;H01L23/495;H01L31/113 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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