发明名称 CORROSION-RESISTANT ELECTRODE STRUCTURE FOR INTEGRATED CIRCUIT DECOUPLING CAPACITORS
摘要 A corrosion resistant electrode structure for interconnecting a decoupling capacitor to a substrate is disclosed. In an exemplary embodiment of the invention, the electrode structure includes a first chromium layer formed upon the capacitor and a first nickel layer formed upon the first chromium layer. A noble metal conductive layer is then formed upon the first nickel layer and a second nickel layer is formed upon said noble metal conductive layer. The second nickel layer has a thickness which is greater than a thickness of the first nickel layer. A second chromium layer is then formed upon the nickel layer.
申请公布号 US2003075805(A1) 申请公布日期 2003.04.24
申请号 US20010047475 申请日期 2001.10.23
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 COPELAND BRUCE A.;GORRELL REBECCA YUNG;SCHEIDER DONALD W.;TAKACS MARK A.;TRAVIS KENNETH J.;ULANMO PETER O.;WANG JUN
分类号 H01L21/02;H01L23/64;(IPC1-7):H01L31/062;H01L23/52;H01L23/48;H01L29/40;H01L23/495;H01L31/113 主分类号 H01L21/02
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