| 发明名称 |
SUBSTRATE SUPPORT |
| 摘要 |
An apparatus for supporting a substrate is provided. In one embodiment, a substrate support is provided having a body and an upper portion having a socket and ball adapted to minimize friction and/or chemical reactions between the substrate support and the substrate supported thereon. The substrate supports may be utilized in various chambers such as load locks and chambers having thermal processes. |
| 申请公布号 |
WO03034473(A2) |
申请公布日期 |
2003.04.24 |
| 申请号 |
WO2002US30268 |
申请日期 |
2002.09.24 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
WHITE, JOHN, M.;HOSOKAWA, AKIHIRO |
| 分类号 |
H01L21/683;H01L21/205;H01L21/673;H01L21/687 |
主分类号 |
H01L21/683 |
| 代理机构 |
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代理人 |
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| 主权项 |
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