发明名称 ELECTRODEPOSITION OF METALS IN HIGH-ASPECT RATIO CAVITIES USING MODULATED REVERSE ELECTRIC FIELDS.
摘要 <p>The interior of cavities and through-holes in electrically conductive substrates having high-aspect ratios of 8:1 or greater can be electroplated with a uniform layer of metal on their interior surfaces by using a pulse reverse voltage waveform having a pulse train of long cathodic pulses followed by short anodic pulses even in the absence of conventional additives such as levelers and brighteners.</p>
申请公布号 WO2003033776(A1) 申请公布日期 2003.04.24
申请号 US2002032716 申请日期 2002.10.15
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