Novel beta-oxo compounds and their use in photoresist

摘要

Polymers comprising monomeric units of acid sensitive (acid labile) monomers and from about 2 to about 20% by weight of monomeric units of beta-oxo ester containing monomers, wherein the beta-oxo ester containing monomers are free of lactams or lactones, are useful as binder resins in radiation sensitive photoresist compositions for producing a resist image on a substrate.