DRESSER FOR POLISHING PAD

摘要

PROBLEM TO BE SOLVED: To provide a dresser for polishing pad capable of remarkably shortening a time required for the quality of the surface of a hard disk substrate as a work to meet the specified values and increasing a dressing performance to such a degree that dummy polishing can be actually eliminated. SOLUTION: This dresser 100 for polishing pad is used for dressing the polishing pad for polishing an aluminum substrate for hard disk or a glass substrate for hard disk. Super abrasive grains having an averaged grain size of 5 to 20 μm are fixed, as one layer of abrasive grain layer 102, onto the surface of the base metal 101 through binding agent.