MULTIPLE-SOURCE ARRAYS FOR CONFOCAL AND NEAR-FIELD MICROSCOPY

摘要

A multiple-source array for illuminating an object including: a source of electromagnetic radiation having a wavelength lambd in vacuum; and a reflective mask positioned to receive the electromagnetic radiation, the reflective mask comprising an array of spatially separated apertures, wherein each aperture comprises a dielectric material defining a waveguide having transverse dimensions sufficient to support one or more guided propagating modes of the electromagnetic radiation extending through the mask, each aperture configured to radiate a portion of the electromagnetic radiation to the object.