| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing device capable of achieving uniform polishing without depending upon the material and thickness of a polished material. SOLUTION: In this polishing device, an electrode 11 is rotatingly driven by a drive device, an abrasive 13 is disposed between the electrode 11 and the polished material 12, and an AC voltage is applied to the electrode 11 to control the abrasive 13 having a dielectric constant by a Coulomb's force so as to polish the polished material 12. Since the electrode 11 comprises a plurality of electrode elements 16a, uniform polishing can be performed without depending upon the material and thickness of the polished material 12. |
