METHOD FOR MODIFYING VOID DEFECTIVE PART OF PHOTOMASK

摘要

PROBLEM TO BE SOLVED: To provide a method for modifying the void defective part of a photomask capable of accurately modifying the void defective part of the light shielding pattern of the photomask. SOLUTION: In the method for modifying the void defective part of a photomask in which a void defective part generated in the mask pattern of a photomask or the like is modified with an FIB (focused ion beam) modifying machine, an engraved part 41 is formed by FIB etching with the FIB modifying machine in a transparent substrate comprising a quartz substrate in a part corresponding to the void defective part and the void defective part of the photomask is modified by imparting a light blocking effect to the part corresponding to the void defective part by the effects of lowering of transmittance by ions radiated on the engraved part 41 and lowering of transmittance due to a step formed along the boundary between the transparent substrate 11 and the engraved part 41.