| 发明名称 |
HIGH-RESOLUTION OVERLAY ALIGNEMENT METHODS AND SYSTEMS FOR IMPRINT LITHOGRAPHY |
| 摘要 |
<p>A system for forming a pattern on a substrate using a patterned template comprising a support configured to hold the patterned template during use, a template adjustment device coupled to the support, wherein the template adjustment device is configured to alter the size of the template during use.</p> |
| 申请公布号 |
EP1303792(A2) |
申请公布日期 |
2003.04.23 |
| 申请号 |
EP20010952771 |
申请日期 |
2001.07.16 |
| 申请人 |
BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM |
发明人 |
CHOI, BYUNG, JIN;COLBURN, MATTHEW;SREENIVASAN, S.V.;BAILEY, TODD |
| 分类号 |
G02B5/18;G03F7/00;B29C35/08;B29C37/00;G03F7/20;H01L21/027;(IPC1-7):G03F7/00;G03F9/00 |
主分类号 |
G02B5/18 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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