METHOD FOR MANUFACTURING Mn-Ir ALLOY SPUTTERING TARGET FOR FORMING MAGNETIC THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing an Mn-Ir alloy sputtering target for forming a magnetic thin film, which emits little gas and generates little particles in sputtering, and is used for forming a diamagnetic film superior in corrosion resistance and magnetic property. SOLUTION: The method for manufacturing the Mn-Ir alloy sputtering target for forming the magnetic thin film is characterized by preliminarily melting a raw Mn material at 1,250-1,500 deg.C; melting and alloying the high-purity Mn material provided by means of vacuum distillation at 1,100-1,500 deg.C, and the high purity Ir material provided by means of degasifying the raw Ir powder at 1,000-1,500 deg.C and melting it with an electron beam; and then casting it.