发明名称 Insulated gate semiconductor device and method of manufacturing the same
摘要 A parasitic transistor of an insulated gate semiconductor device does not easily turn on, so that an SOA of the insulated gate semiconductor device is improved. N<+> emitter layers (44) are formed on a surface of a P base layer (43) of a U-type IGBT so as to leave an exposed surface of the P base layer (43) in a scattered configuration. An emitter electrode (51) contacts link portions (55) of the N<+> emitter layers (44) and the exposed surfaces of the P base layer (43), alternatively. A trench pitch is small, and therefore, a parasitic transistor which is formed by an N<+> emitter region (4), a P base layer (3) and an N<-> layer (2) does not easily turn on. <IMAGE>
申请公布号 EP1237201(A3) 申请公布日期 2003.04.23
申请号 EP20020012507 申请日期 1996.05.09
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 TAKAHASHI, HIDEKI
分类号 H01L29/78;H01L21/331;H01L29/06;H01L29/10;H01L29/739 主分类号 H01L29/78
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