发明名称 HYBRID COMPOUND, RESIST MATERIAL AND METHOD OF FORMING PATTERN
摘要 PROBLEM TO BE SOLVED: To provide a hybrid compound that is used as a base polymer for the resist material and shows excellent adhesion to the metal base plate. SOLUTION: The hybrid compound comprises a phenolic resin and a silicone resin that is obtained by hydrolyzing and condensing an organoxysilane represented by general formula (1): R<1> n Si(OR<2> )4-n (wherein R<1> is a monovalent hydrocarbon group including sulfur or oxygen atoms; R<2> is a monovalent hydrocarbon group; n is 1 or 2).
申请公布号 JP2003119344(A) 申请公布日期 2003.04.23
申请号 JP20010314863 申请日期 2001.10.12
申请人 SHIN ETSU CHEM CO LTD 发明人 KATO HIDETO;FURUHATA TOMOYOSHI
分类号 C08G8/28;C08L61/04;C08L83/04;G03F7/023;G03F7/075;H01L21/027 主分类号 C08G8/28
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