发明名称 |
HYBRID COMPOUND, RESIST MATERIAL AND METHOD OF FORMING PATTERN |
摘要 |
PROBLEM TO BE SOLVED: To provide a hybrid compound that is used as a base polymer for the resist material and shows excellent adhesion to the metal base plate. SOLUTION: The hybrid compound comprises a phenolic resin and a silicone resin that is obtained by hydrolyzing and condensing an organoxysilane represented by general formula (1): R<1> n Si(OR<2> )4-n (wherein R<1> is a monovalent hydrocarbon group including sulfur or oxygen atoms; R<2> is a monovalent hydrocarbon group; n is 1 or 2). |
申请公布号 |
JP2003119344(A) |
申请公布日期 |
2003.04.23 |
申请号 |
JP20010314863 |
申请日期 |
2001.10.12 |
申请人 |
SHIN ETSU CHEM CO LTD |
发明人 |
KATO HIDETO;FURUHATA TOMOYOSHI |
分类号 |
C08G8/28;C08L61/04;C08L83/04;G03F7/023;G03F7/075;H01L21/027 |
主分类号 |
C08G8/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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