发明名称 Plasma surface treatment method and resulting device
摘要 The present invention provides a method for treating a surface of an object using, for example, a downstream region of a plasma source. The method includes a step of generating a plasma from a gas-C in a plasma source, where the gas-C includes a gas-A and a gas-B. Gas-A is selected from a compound comprising at least a nitrogen bearing compound or an other gas. The other gas is selected from a mixture of an element in group 18 classified in the atomic periodic table. Gas-B includes at least a NH3 bearing compound. The method also includes a step of injecting a gas-D downstream of the plasma source of the gas-C. The method also includes a step of setting an object (having a surface) downstream of the gas-D injection and downstream of the plasma source. A step of processing the surface of the object by a mixture species generated from the gas-C in the plasma and the gas-D is included. The NH3 bearing compound in the gas-C includes a NH3 bearing concentration that is lower than an explosion limit of NH3, which is safer than conventional techniques.
申请公布号 US6551939(B2) 申请公布日期 2003.04.22
申请号 US19990268203 申请日期 1999.03.15
申请人 ANNEAL CORPORATION 发明人 TAKAMATSU TOSHI;FUJIMURA SHUZO
分类号 G03F7/42;H01L21/306;H01L21/311;(IPC1-7):H01L21/302 主分类号 G03F7/42
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