发明名称 Process for producing thin film metal oxide coated substrates
摘要 Processes for coating three dimensional inorganic substrates, with shielded surfaces, with metal oxide-containing coatings are disclosed. Such processes comprise contacting a substrate with a metal oxide precursor reactant mixture at fast reaction and elevated temperature reaction conditions maintained by an RF induction plasma thermal source, to form a substrate containing metal oxide on at least a portion of the three dimensions and shielded surfaces of the substrate. Also disclosed are substrates coated with metal oxide-containing coatings for use in various applications including catalysis, shielding, electrostatic dissipation and battery applications.
申请公布号 US6551656(B1) 申请公布日期 2003.04.22
申请号 US20010861105 申请日期 2001.05.18
申请人 ENSCI INC. 发明人 CLOUGH THOMAS J.
分类号 C23C4/12;(IPC1-7):B05D7/00 主分类号 C23C4/12
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