| 摘要 |
A wafer stage chamber assembly is provided to isolate semiconductor substrates, a wafer stage device, and the process of making semiconductor wafers from the atmosphere so that the resulted wafers have an improved quality and meet certain wafer manufacturing specifications. The wafer stage chamber assembly includes a wafer stage chamber for sealing a wafer stage device from the atmosphere outside the wafer stage chamber, and at least one loader port for loading and unloading substrates into the wafer stage chamber. The wafer stage chamber is constructed of a chamber frame to enclose the wafer stage device, and a plurality of chamber walls including a front panel having the at least one loader port for loading and unloading a plurality of semiconductor substrates into the wafer stage chamber. The wafer stage chamber assembly also includes a top wall and a base frame. The chamber walls are layered with insulating materials, while the joint between the chamber frame with the top wall and base frame are sealed with sealing materials. The wafer stage chamber assembly is supported by an apparatus frame of an exposure device via a plurality of body supports.
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